The Pulse Pattern Controller PPC-1 is intended for the direct use in plasma processing equipment containing high-current pulse generators. It is suitable for high-current pulse generators, which are equipped with external modulation input controlled by a pulse pattern. Using the PPC-1, a low-cost, industry-compliant solution is provided to control plasma processes equipped with pulse generators.

Due to its modularity, the PPC-1 is used in R & D at various universities and research institutions as well as in industrial pilot plants.
» driving high current pulse generators (HIPIMS Technology)
» programmable pulse pattern
» fast recording of pulse voltage and pulse current
» integration of additional sensors
» flexible use - due to modular construction

In PPC-2 , two CCD spectrometers (200 - 1100 nm) can be integrated additionally to the optical process control.For the adaptation to existing plasma systems as well as other optics, further optical components and spectroscopy accessories are available.

Possible application fields are:

» HIPIMS - process control
» process monitoring
» process control of pulse current and pulse voltage (additional sensors available)
» optical process control (PPC 2 only)

Specifications are subject to change without notice.