The EMICON SA systems from our partner company PLASUS GmbH are specifically designed for comprehensive process control and quality assurance of plasma processes in industrial plants and production lines. Thanks to their unique ability to capture all essential process data in real time within a single system, they set the global standard for successful process control.
Key hardware components and central firmware modules were developed and manufactured by IfU Diagnostic Systems GmbH.
EMICON SA systems are synonymous with precise and reliable process control in plasma applications. Whether it’s sputtering, etching or HIPIMS, they monitor stability, detect contamination and enable spatially resolved measurements, even across large areas. With 24/7 stand-alone operation, setpoint and PID control functions, and multi-channel systems, they offer maximum control and efficiency for your production processes.
Spectrometer channels:
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Integration time:
Acquisition rate:
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Fieldbuses:
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Dimensions (WxHxD):
up to 8
1.5 nm
200 – 1100 nm
16 bit
50 µs to seconds
10 ms to minutes
0 – 10 V (2/4)
0 – 10 V (4/8)
TTL 5 V / 24 V (8/8)
LAN (TCP/IP)
Profibus, Profinet, EtherCAT, EtherNET/IP
24 VDC 2A
480 mm x 190 mm x 420 mm